MNTL Cleanroom Questionnaire

MNTL Cleanroom Questionnaire

answer must be a university ID like 612345678

 

 

 

 

answer must be phone number with area code like 217-333-1000

 

answer must be an email address

 

 

 

 

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Instructions for questions 11 through 26.

11. For the following equipment list, please select any and all that apply.

Indicate one of the following answers for each of the questions below.

Equipment you plan to use at MNTLEquipment you have experience with

(A.) Electron Beam Lithography

(B.) Optical Lithography

(C.) Scanning Electron Microscopy

(D.) Atomic Force Microscopy

(E.) Diffusion/Oxidation/Anneal

(F.) Plasma Etching

(G.) Plasma Deposition

(H.) Low-Pressure Chemical Vapor Deposition

(I.) E-beam or Thermal Evaporation

(J.) Sputter Deposition

(K.) Atomic Layer Deposition

(L.) Wet Chemical Etching

(M.) Chemical Vapor Deposition

(N.) Rapid Thermal Processing

(O.) Film Characterization

(P.) Surface Profilometry

 

required14. Have you completed a course in semiconductor device processing, such as ECE 444 or ME 487?

required14. Have you completed a course in semiconductor device processing, such as ECE 444 or ME 487?

15. If you answered "yes" to Question 14, please complete the following items. If "no," please skip to Question 16.

15. If you answered "yes" to Question 14, please complete the following items. If "no," please skip to Question 16.

 

 

 

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required16. Do you have cleanroom experience?

required16. Do you have cleanroom experience?

required18. On average, how many hours per week do you expect to be working in the MNTL cleanrooms?

required18. On average, how many hours per week do you expect to be working in the MNTL cleanrooms?

required19. For how long do you expect to need access to the MNTL cleanrooms?

required19. For how long do you expect to need access to the MNTL cleanrooms?

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